Exhibitor

 Quantum NIL Corporation

TaiwanInnoVEX 2026  S0311a

Corporation

Manufacturing Technology

Pavilion: SMESA Theme Pavilion

Funding Stage: pre A Round Founding Year: 2024
Looking for
InP Laser Grating's photo

InP Laser Grating

InP-based lasers are the core photonic sources for telecom and datacom systems. The embedded grating within the InP laser wafer plays a critical role in determining the laser emission wavelength. Quantum NIL provides wafer-level grating fabrication services on customer-supplied epitaxy-grown InP wafers. The grating specifications require pitch accuracy within 0.2 nm and crystal-plane alignment accuracy within 0.02 degrees. Quantum NIL’s grating process solution package supports high-volume production for InP wafers ranging from 2-inch to 6-inch sizes, enabling precise and scalable manufacturing for next-generation optical communication devices.

Metalens for AR glass's photo

Metalens for AR glass

The next generation of AR glasses aims to deliver lightweight design and vivid interactive information display. To achieve this, conventional optical lenses must be replaced by flat optics known as metalenses. A metalens is composed of millions of nanorods precisely arranged to perform the same optical functions as traditional lenses. Typically, the diameter of each nanorod ranges from 40 nm to 250 nm, while the height ranges from 150 nm to 500 nm. The geometric complexity of metalenses creates significant challenges in achieving high-volume manufacturing and competitive production costs. Quantum NIL’s hybrid nanoimprint lithography platform provides a scalable solution for fabricating these high-density nanostructures with high precision, enabling the commercialization of next-generation AR/VR optical systems.

Nanofluidic Channel Array's photo

Nanofluidic Channel Array

Nanofluidic channels form the fundamental basis for next-generation biochips. To effectively enable multifunctional biochip systems, multilayer nanofluidic channels integrated on a single template are highly desirable. Quantum NIL’s hybrid NIL process platform enables the fabrication of multilayer nanofluidic channels across different material systems, allowing further integration of conductive and functional structures within the chip. These layered channels can be precisely aligned in multiple directions within a compact form factor, while the channel diameter is tunable from 30 nm to 150 nm. This capability supports the development of advanced biomedical chips with higher functionality, improved integration density, and enhanced performance for diagnostics, sensing, and lab-on-a-chip applications.

Company Description

Quantum NIL is a Taiwan-based deep-tech company developing a flexible nanofabrication foundry platform powered by nanoimprint lithography (NIL). It provides wafer-level manufacturing solutions for high-precision nanostructures across photonics, compound semiconductors, and emerging applications.

The platform enables scalable production of advanced devices, including laser components for AI-driven data centers, meta-optics, and bio-integrated chips. Compared with conventional e-beam lithography, Quantum NIL’s proprietary hybrid NIL process delivers higher throughput, lower cost, and strong adaptability across materials, positioning it as a key enabler of next-generation device innovation.